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Analysis of the SiO2/Si3N4 passivation bilayer thickness on the rectifier behavior of AlGaN/GaN HEMTs on (111) silicon substrate

✍ Scribed by M. Mattalah; A. Soltani; J.-C. Gerbedoen; Az. Ahaitouf; N. Defrance; Y. Cordier; J.-C. De Jaeger


Book ID
112182210
Publisher
John Wiley and Sons
Year
2012
Tongue
English
Weight
543 KB
Volume
9
Category
Article
ISSN
1862-6351

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