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Analysis of the design space available for high-kgate dielectrics in nanoscale MOSFETs

โœ Scribed by David J Frank; Hon-Sum P Wong


Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
593 KB
Volume
28
Category
Article
ISSN
0749-6036

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โœฆ Synopsis


We present an analysis of the scaling behavior of MOSFETs with high-k gate insulators which elucidates the useful design space for such insulators. This analysis demonstrates that the design space is smaller than might be hoped and that within it, nanoscale bulk MOSFETs can only gain up to โˆผ20% additional scaling by use of high-k insulators, while symmetric double-gated FETs may gain up to โˆผ30%. It is shown that this analysis does not depend significantly on the gate sidewall dielectric constant or its spacing.


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