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Analysis of structural defects in boron-implanted silicon single crystals on the basis of the results of double-and triple-crystal x-ray diffractometry

✍ Scribed by A. P. Petrakov; N. A. Tikhonov; S. V. Shilov


Book ID
110120932
Publisher
Springer
Year
1998
Tongue
English
Weight
90 KB
Volume
43
Category
Article
ISSN
1063-7842

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## Abstract Analytical expressions for coherent and diffuse scattering intensities with account for imperfections in all the crystals of double‐ and triple‐crystal diffractometers (DCD and TCD) have been derived from the generalized dynamical theory of X‐ray scattering in real single crystals which