Analysis of LPCVD process conditions for the deposition of low stress silicon nitride. Part I: preliminary LPCVD experiments

✍ Scribed by James M Olson

• Publisher: Elsevier Science
• Year: 2002
• Tongue: English
• Weight: 131 KB
• Volume: 5
• Category: Article
• ISSN: 1369-8001
• DOI: 10.1016/s1369-8001(02)00058-6