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An X-ray photoelectron study of the dependence of HF concentration on an etched silicon surface

✍ Scribed by E.T.Paul Benny; J. Majhi

Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
720 KB
Volume
58
Category
Article
ISSN
0368-2048

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Silicon carbide (Sic) was chemical vapor deposited (CVD) onto a carbon fiber to investigate oxidation protection of the coating. This thin film of Sic was analyzed before and after argon and oxygen ion beam etching with core and valence band X-ray Photoelectron Spectroscopy (XPS). The valence band o