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An X-ray photoelectron spectroscopy study of the HF etching of native oxides on Ge(111) and Ge(100) surfaces

โœ Scribed by Terri Deegan; Greg Hughes

Book ID
108418591
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
289 KB
Volume
123-124
Category
Article
ISSN
0169-4332

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XPS and UPS studies of xenon adsorbed on and implanted into Ni (100) and Ni (11 I) surfaces indicate that the sum of the potentil and relaxation shifts (1.1 to 1.3 eV) is similar for both core and valence levels. The binding energies of the core and valence levels are systematicaIiy lower for Xe ads