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An optical microscopy imaging method for detection of electromigration-induced damage

✍ Scribed by L.H. Li; C. Piecuch; J. Hiatt; B. Setlik; D. Heskett

Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
255 KB
Volume
75
Category
Article
ISSN
0167-9317

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✦ Synopsis

Electromigration damage is a microscopic phenomenon involving electric field-induced diffusion, which is very relevant to damage in interconnects. Recently, we have developed a novel and useful optical microscopy method with which we can visually observe and record such damage formation during an accelerated stress test. This new noncontact technique provides complementary information to the more traditional probe of electrical resistance.

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