An investigation of the gas-phase reaction of atomic bromine with disilane: implications for the Si2H5H bond strength
✍ Scribed by A. Goumri; W-J. Yuan; Luying Ding; Paul Marshall
- Publisher
- Elsevier Science
- Year
- 1993
- Tongue
- English
- Weight
- 388 KB
- Volume
- 204
- Category
- Article
- ISSN
- 0009-2614
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✦ Synopsis
The rate constant for the reaction B~(~P)~P,+S~,H~ has been measured with the flash-photolysis resonance-fluorescence technique to be ( 1.35?0.12) x 10-'Oexp( -3.05 f0.3 kJ mol-'/RT) cm3 s-' over the temperature range 295-565 K. Theuncertainties represent ? lo in the Arrhenius parameters, while 95O/a accuracy limits are about f 12%. The results are combined with an assumed activation energy for the reaction Si,H,+HBr+Si,H,+Br to yield an estimated Si-H bond dissociation enthalpy of 372+5 kJ mol-' at 298 K, which is in accord with most previous experimental and ab initio estimates, and thence AHr,,,,(Si,H,)=234k5 kJ mol-'.
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