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An in situ growth method for property control of LPCVD polysilicon film

✍ Scribed by Hongbin Yu; Haiqinq Chen; Jun Li; Chao Wang


Book ID
115367040
Publisher
Optics InfoBase
Year
2004
Tongue
English
Weight
620 KB
Volume
2
Category
Article
ISSN
1671-7694

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In-Situ Optical Pyrometry in the CVD of
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## Abstract In‐situ temperature measurement is essential in CVD in order to control the temperature of the growing films. This is frequently achieved by optical pyrometry because it is a sensitive, convenient, and inexpensive technique that can be used in corrosive atmospheres. In this work, in‐sit