An analytical study of the Chemical Vapor Deposition (CVD) processes in a rotating pedestal reactor

✍ Scribed by K. Chen; A.R. Mortazavi

• Publisher: Elsevier Science
• Year: 1986
• Tongue: English
• Weight: 817 KB
• Volume: 76
• Category: Article
• ISSN: 0022-0248
• DOI: 10.1016/0022-0248(86)90025-4