An analysis of the TiN plasmachemical vapor deposition process based on optical emission spectroscopy measurements

✍ Scribed by S Peter; H Giegengack; F Richter; R Tabersky; U König

• Book ID: 117226623
• Publisher: Elsevier Science
• Year: 2001
• Tongue: English
• Weight: 146 KB
• Volume: 398-399
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/s0040-6090(01)01375-x