Potential of amorphous Mo–Si–N films for
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M. Ylönen; H. Kattelus; A. Savin; P. Kivinen; T. Haatainen; J. Ahopelto
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Article
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2003
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Elsevier Science
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English
⚖ 123 KB
The properties of amorphous metallic molybdenum-silicon-nitrogen (Mo-Si-N) films were characterised for use in nanoelectronic applications. The films were deposited by co-sputtering of molybdenum and silicon targets in a gas mixture of argon and nitrogen. The atomic composition, microstructure and s