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Alternative Nb2O5-TiO2 thin films for electrochromic devices

✍ Scribed by E. Da Costa; C. O. Avellaneda; A. Pawlicka


Book ID
110364846
Publisher
Springer
Year
2001
Tongue
English
Weight
202 KB
Volume
36
Category
Article
ISSN
0022-2461

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V 2 O 5 thin films were prepared by using pulsed-laser deposition technique. The influences of substrate temperature and oxygen partial pressure on the growth of V 2 O 5 films were studied. X-ray diffraction, atomic force microscopy, Raman measurements and the optical transmission measurements have