Al2O3 thin films by plasma-enhanced chemical vapour deposition using trimethyl-amine alane (TMAA) as the Al precursor

✍ Scribed by C.E. Chryssou; C.W. Pitt

• Publisher: Springer
• Year: 1997
• Tongue: English
• Weight: 913 KB
• Volume: 65
• Category: Article
• ISSN: 1432-0630
• DOI: 10.1007/s003390050611