AIP Conference Proceedings [AIP ION IMPLANTATION TECHNOLOGY 2101: 18th International Conference on Ion Implantation Technology IIT 2010 - Kyoto, (Japan) (6–11 June 2010)] - Energy effects on the sputtering yield of Si bombarded with gas cluster ion beams

✍ Scribed by Ichiki, K.; Ninomiya, S.; Seki, T.; Aoki, T.; Matsuo, J.; Matsuo, Jiro; Kase, Masataka; Aoki, Takaaki; Seki, Toshio

• Book ID: 115483282
• Publisher: AIP
• Year: 2011
• Weight: 697 KB
• Volume: 0
• Category: Article
• DOI: 10.1063/1.3548384