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Ag surfactant effects of TiO2 films prepared by sputter deposition

✍ Scribed by Masao Kamiko; Kazuaki Aotani; Ryo Suenaga; Jung-Woo Koo; Jae-Geun Ha

Book ID
113940907
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
708 KB
Volume
86
Category
Article
ISSN
0042-207X

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Ag nanostructures on TiO 2 films were deposited by RF magnetron sputtering under variable deposition parameters, such as DC potential, RF-power and total pressure. The concentration, shape, and distribution of the deposited nanostructures and continuous Ag films on thin films of TiO 2 can be tailore