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AES analysis of barium fluoride thin films

✍ Scribed by G.N. Kashin; V.I. Makhnjuk; S.M. Rumjantseva; Ju.M. Shchekochihin


Book ID
103616756
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
252 KB
Volume
70-71
Category
Article
ISSN
0169-4332

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Quantitative AES analysis of TiSi x (1.3 ≀ x ≀ 2.1) thin films deposited on silicon by co-sputtering in a magnetron system has been performed. The time variation of the surface composition during sputtering with Ar Y ions of 3 keV energy has been explained using a kinetic model that allows one to de