✦ LIBER ✦

Advancing the ion beam thin film planarization process for the smoothing of substrate particles

✍ Scribed by P.B. Mirkarimi; E. Spiller; S.L. Baker; J.C. Robinson; D.G. Stearns; J.A. Liddle; F. Salmassi; T. Liang; A.R. Stivers

Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 415 KB
Volume: 77
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2004.12.098

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Measurement of the thickness of thin fil

Measurement of the thickness of thin films deposited on smooth non-planar substrates.

✍ S.E. Gustafsson; Ijaz-Ur-Rehman; M. Saleem Iqbal 📂 Article 📅 1978 🏛 Elsevier Science 🌐 English ⚖ 380 KB

Application of ion beam analysis to the

Application of ion beam analysis to the selective sublimation processing of thin films for gas sensing

✍ A. Vomiero; C. Scian; G. Della Mea; V. Guidi; G. Martinelli; G. Schiffrer; E. Co 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 125 KB

Ion beam analysis was successfully applied to a novel technique, named selective sublimation process (SSP), for deposition of nanostructured gas-sensing films through reactive sputtering. The method consists of the co-deposition of a mixed oxide, one of which has a relatively low sublimation tempera

Sputter etching effect of the substrate

Sputter etching effect of the substrate on the microstructure of β-FeSi2 thin film prepared by ion beam sputter deposition method

✍ M. Sasase; K. Shimura; K. Yamaguchi; H. Yamamoto; S. Shamoto; K. Hojou 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 643 KB

Beta iron disilicide (b-FeSi 2 ) is one of the candidate materials for a compound semiconductor, which is promising for optoelectronic devices. b-FeSi 2 film has been obtained by ion beam sputter deposition (IBSD) on Si(1 0 0) substrates that are pre-treated by sputter etching by Ne + . In the prese

Theoretical and experimental investigati

Theoretical and experimental investigation of particle beams for the formation of thin films under vacuum

📂 Article 📅 1967 🏛 Elsevier Science 🌐 English ⚖ 158 KB

Use of the direct negative Cu ion beam d

Use of the direct negative Cu ion beam deposition for the control of the properties of Cu thin film

✍ Daeil Kim 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 1010 KB

Investigations on the influence of proce

Investigations on the influence of process parameters on the structural evolution of ion beam sputter deposited chromium thin films

✍ R. Balu; A.R. Raju; V. Lakshminarayanan; S. Mohan 📂 Article 📅 2005 🏛 Elsevier Science 🌐 English ⚖ 365 KB

Chromium thin films are technologically important as underlayers for the deposition of cobalt-based magnetic films because of their good lattice match and adhesion. The structural orientation and morphology of the chromium under layers control the magnetic properties of the cobalt-based films deposi