Advances in resist technology and processing II. Proceedings of SPIE – The international society for optical engineering. Vol. 539. LARRY F. THOMPSON, Editor. ISBN 0-89252-574-6. Bellingham, Washington: SPIE 1985. VI, 350 S., $ 61.00

Advance in resist technology and process

Advance in resist technology and processing III. Proceedings of SPIE – The Internatinal Society for Optical Engineering Vol. 631. C. GRANT WILLSON, Chairman/Editor. Bellingham, WA: SPIE – The International Society for Optical Engineering 1986. VI, 346 pages, $ 61.00

✍ G. Reinisch 📂 Article 📅 1988 🏛 John Wiley and Sons 🌐 English ⚖ 165 KB 👁 1 views

The 3rd mnual meeting of the SPIE dealing with resist materials and processing was held again in Santa Clara/CA in the United States. In 3 lecture sessions and additionally in a poster presentation 44 papers (21 oral communications) wcrc offered. The reports were delivered by representatives of lead