Advance in resist technology and processing III. Proceedings of SPIE – The Internatinal Society for Optical Engineering Vol. 631. C. GRANT WILLSON, Chairman/Editor. Bellingham, WA: SPIE – The International Society for Optical Engineering 1986. VI, 346 pages, $ 61.00

✍ Scribed by G. Reinisch

• Publisher: John Wiley and Sons
• Year: 1988
• Tongue: English
• Weight: 165 KB
• Volume: 39
• Category: Article
• ISSN: 0323-7648
• DOI: 10.1002/actp.1988.010390330

✦ Synopsis

The 3rd mnual meeting of the SPIE dealing with resist materials and processing was held again in Santa Clara/CA in the United States. In 3 lecture sessions and additionally in a poster presentation 44 papers (21 oral communications) wcrc offered. The reports were delivered by representatives of leading laboratories in the USA and Japan.

Yolymcr Chemistry, combined with photo-and radiation chemistrj-are acting as the pacemakers in resist development. Accordingly, new sensitive resist polymers, capable of high resolution efficiency, have been synthesized and evaluated. Worth mentioning are e.g.: