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Advances in hot wire chemical vapor deposition technology for the synthesis of novel silicon thin films materials

✍ Scribed by A.R. Middya


Book ID
116669225
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
494 KB
Volume
352
Category
Article
ISSN
0022-3093

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πŸ“œ SIMILAR VOLUMES


Effects of deposition pressure on the mi
✍ Peiqing Luo; Zhibin Zhou; Youjie Li; Shuquan Lin; Xiaoming Dou; Rongqiang Cui πŸ“‚ Article πŸ“… 2008 πŸ› Elsevier Science 🌐 English βš– 474 KB

We report on the effects of deposition pressure P d on the growth and properties of the B-doped nanocrystalline silicon (nc-Si:H) thin films grown by hot-wire chemical vapor deposition (HWCVD) at very high hydrogen dilution of 98.8%. We found that the crystallinity of nc-Si:H or mc-Si:H films is not