Adsorption studies of digermane and disilane on Ge(100)
β Scribed by Ateca, S.; Bater, C.; Sanders, M.; Craig, J. H.
- Publisher
- John Wiley and Sons
- Year
- 2000
- Tongue
- English
- Weight
- 155 KB
- Volume
- 29
- Category
- Article
- ISSN
- 0142-2421
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β¦ Synopsis
Adsorption studies of digermane (Ge 2 H 6 ) and disilane (Si 2 H 6 ) on Ge(100) are reported. Temperatureprogrammed desorption (TPD) experiments suggest the existence of two hydrogen adsorption states in the submonolayer regime for both digermane and disilane. The TPD spectra observed for disilane on Ge(100) are qualitatively similar to previous studies of disilane adsorbed on thin epitaxial layers of germanium on Si(100). These spectra show the existence of an a-state arising from the germanium monohydride and a b 1 -state arising from a silicon monohydride. The two-peak structure observed in the hydrogen TPD spectra for digermane on Ge(100) suggests the existence of both germanium monohydride and germanium dihydride, about which there is disagreement in the literature. However, high-resolution electron energy-loss spectroscopy and lowenergy electron diffraction provide additional evidence for the existence of both germanium hydrides on the digermane/Ge(100) system. Kinetic energy distributions of electronically desorbed H Y and hydrogen removal cross-sections obtained through electron-stimulated desorption are also presented for both systems.
π SIMILAR VOLUMES
The atomic and electronic structures of Ge dimers adsorbed on top of a Si(100) flat surface has been investigated by first-principles molecular dynamics method. Four high-symmetry configurations have been considered and thoroughly relaxed. The most stable configuration for Ge dimers is found to be o
We present the results of the in situ infrared study of the behavior of NO with CO on Pt(100) carried out in a continuous Γow reactor at 470 K and 500 K. The frequency of the solitary IR band observed at 470 K during adsorption of nitric oxide shifted by 68-73 cm-1 when we used 15N18O instead of NO.