## Abstract The adducts of niobium(V) and tantalum(V) halides with some phosphoryl compounds have been studied in chloroform solution by ^1^H‐ and ^19^F‐FT‐NMR. spectroscopy. These octahedral adducts of general formula MX~5~ · L (M = Nb, Ta; X = F, Cl, Br; L = phosphoryl ligand) are monomeric and n
Adducts of Niobium(V) and Tantalum(V) Halogenides. IX. Relative stability of the adducts of the chlorides and bromides with some dialkylchalcogenides
✍ Scribed by René Good; André E. Merbach
- Publisher
- John Wiley and Sons
- Year
- 1974
- Tongue
- German
- Weight
- 364 KB
- Volume
- 57
- Category
- Article
- ISSN
- 0018-019X
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✦ Synopsis
Abstract
The relative stability of adducts formed by Nb(V) and Ta(V) pentachlorides and bromides with some dimethylchalcogenides and nitriles has been determined by ^1^H‐NMR. in dichloromethane at − 60°. The stabilities are explained in terms of the HSAB principle and Jørgensen's symbiotic effect. A good correlation exists between the ionisation potential of the valence p orbital of the chalcogen atom in the ligand and the logarithm of the relative stability of the adduct formed with a given acid.
📜 SIMILAR VOLUMES
The ligand exchange MX5 . L + \*L 8 MX, . \*L + L for the octahedral adducts MX, . L, in an inert solvent (CH2CI2 or CHCI,) with neutral ligands, proceeds via a dissociative D mechanism when M = Nb, X = C1 and L= phosphoryl compound. A dissociative interchange Id mechanism is suggested when M = N b
## Abstract There are presented the results of the investigation of tantalum‐ and niobium‐based metal‐oxide bilayers degration in dependence on chemical composition of base metal. Nitrogen dissolved in metal increases stability of chemical composition and electrical properties of oxide films grown