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Activation energies in chemical vapour deposition kinetics of SiO2 films using TEOS chemistry

✍ Scribed by Cristian Pavelescu; Irina Kleps

Publisher: Elsevier Science
Year: 1990
Tongue: English
Weight: 176 KB
Volume: 190
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(90)90140-9

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