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Acoustooptical spectrometric control of process of plasmochemical etching of a masking photoresistive layer and silicon structures

✍ Scribed by F. L. Bizen; V. N. Zhogun; S. I. Zemtsovskii; V. I. Pustovoit; N. A. Ponomareva; I. M. Tirashkevich; A. V. Tyablikov; L. L. Pal'tsev

Publisher: Springer US
Year: 1990
Tongue: English
Weight: 336 KB
Volume: 52
Category: Article
ISSN: 0021-9037
DOI: 10.1007/bf00664788

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