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Acid and Surfactant Effect on Chemical Mechanical Polishing of Ge[sub 2]Sb[sub 2]Te[sub 5]

✍ Scribed by Wang, Liangyong; Liu, Bo; Song, Zhitang; Feng, Songlin; Xiang, Yanghui; Zhang, Fuxiong

Book ID: 126718041
Publisher: The Electrochemical Society
Year: 2009
Tongue: English
Weight: 395 KB
Volume: 156
Category: Article
ISSN: 0013-4651
DOI: 10.1149/1.3158529

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