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Accumulation of Radiation Defects in Oxygen-Rich n-Type Silicon Heat-Treated at Temperatures from 600 to 1000 °C

✍ Scribed by Bolotov, V. V. ;Kakpov, A. V. ;Stuchinsky, V. A. ;Schmalz, K.


Publisher
John Wiley and Sons
Year
1986
Tongue
English
Weight
353 KB
Volume
96
Category
Article
ISSN
0031-8965

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