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Acceleration effect of electroless nickel deposition by thiourea

✍ Scribed by Han Ke-Ping; Fang Jing-Li

Publisher
John Wiley and Sons
Year
1996
Tongue
English
Weight
406 KB
Volume
28
Category
Article
ISSN
0538-8066

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✦ Synopsis

It was found that the presence of thiourea can increase the electroless nickel ( E N ) deposition rate and hydrogen evolution simultaneously. Influences of thiourea on the electrochemical behaviors of EN solution and activation energy of EN reaction were studied. The composition of the deposit was also determined by means of X-ray photoelectron spectroscopy (XPSI and Auger electron spectroscopy (AES) The results show that thiourea accelerates the nickel deposition due to interference in the anodic process of E N plating 0 1996

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