Use of carbon-free Ta2O5 thin-films as a
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R.A.B. Devine; C. Chaneliere; J.L. Autran; B. Balland; P. Paillet; J.L. Leray
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Article
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1997
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Elsevier Science
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English
⚖ 276 KB
A novel electron cyclotron resonance plasma-enhanced chemical vapor deposition process using an alternative carbon-free source, namely TaFs, is proposed to obtain high quality amorphous Ta205 films. The excellent physical and electrical properties suggest that this material is clearly compatible wit