𝔖 Bobbio Scriptorium
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ABS rings resist corrosion and chipping


Book ID
116032892
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
381 KB
Volume
48
Category
Article
ISSN
0026-0657

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πŸ“œ SIMILAR VOLUMES


Novel Molecular Resist Based on a First
✍ Hajime Mori; Eisaku Nomura; Asao Hosoda; Yasuhito Miyake; Hisaji Taniguchi πŸ“‚ Article πŸ“… 2006 πŸ› John Wiley and Sons 🌐 English βš– 165 KB

## Abstract **Summary:** A novel chemically amplified negative‐tone molecular resist for electron‐beam (EB) lithography was developed. The base matrix had six furan rings as a reactive functional group at its terminal. The resist containing the matrix, a crosslinker and a photoacid generator worked