๐”– Bobbio Scriptorium
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About the oxidation of SiCl4 and GeCl4 in homogeneous gaseous phase

โœ Scribed by Dr. sc. nat. P. Kleinert; Dr. D. Schmidt; Dr. J. Kirchhof; A. Funke


Publisher
John Wiley and Sons
Year
1980
Tongue
English
Weight
236 KB
Volume
15
Category
Article
ISSN
0232-1300

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High resolution gas phase photoabsorptio
โœ J.D. Bozek; K.H. Tan; G.M. Bancroft; J.S. Tse ๐Ÿ“‚ Article ๐Ÿ“… 1987 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 824 KB

High resolution gas phase photoabsorption spectra of SiCl, and Si(CHa)4 have been measured using synchrotron radiation in the loo-225 eV photon energy range. This range encompasses the Si 2p, Si 2s and Cl 2p edges. Comparison with previous spectra shows that the high resolution is essential for char