Variable charge molecular dynamics have been performed to study the diffusion mechanisms of oxygen atoms (O) in nickel (Ni) in the temperature range 950 K-1600 K. It is observed that oxygen does not diffuse via jumps of oxygen through interstitial sites but via a vacancy diffusion mechanism. The oxy
A variable charge molecular dynamics study of the initial stage of nickel oxidation
β Scribed by S. Garruchet; O. Politano; P. Arnoux; V. Vignal
- Publisher
- Elsevier Science
- Year
- 2010
- Tongue
- English
- Weight
- 885 KB
- Volume
- 256
- Category
- Article
- ISSN
- 0169-4332
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β¦ Synopsis
The oxidation of nickel single crystals is investigated by using variable charge molecular dynamics. The simulations are performed on three nickel low-index surfaces ((1 0 0), (1 1 0) and (1 1 1)) at temperatures between 300 K and 950 K. The results show that the shape of the oxidation kinetics is independent of the crystallographic orientation and the temperature under the present conditions. The oxide thin film grows according to an island growth mode, this initial stage of oxidation can be divided in three steps: (i) the dissociative chemisorption step (ii) the oxide island nucleation and (iii) the lateral growth of the island. The first step is slowdown/speedup by the surface orientation and temperature. Finally, the simulations show the onset of an oxide layer.
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