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A two-dimensional B implantation model for semiconductor process simulation environments

✍ Scribed by K.M. Klein; C. Park; S. Morris; S.-H. Yang; A.F. Tasch

Book ID: 113284064
Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 470 KB
Volume: 79
Category: Article
ISSN: 0168-583X
DOI: 10.1016/0168-583x(93)95435-8

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