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A treatment of impurity diffusion in oxidizing ambients

โœ Scribed by H. Guckel; L.A. Hall


Publisher
Elsevier Science
Year
1975
Tongue
English
Weight
438 KB
Volume
18
Category
Article
ISSN
0038-1101

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Impurity diffusion of 114In in Cu
โœ Dipl.-Phys. G. Krautheim; Dipl.-Phys. A. Neidhardt; Dipl.-Phys. U. Reinhold ๐Ÿ“‚ Article ๐Ÿ“… 1978 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 274 KB ๐Ÿ‘ 1 views

Using the tracer-standard sectioning technique the impurity diffusion of indium in copper has been investigated in the temperature range from 798.1 to 1081.0 "C. For the frequency factor and the activation energy, respectively, the following values were determined : Do, = 1.87 cni2 . s-1; Q, = 2.034