A TEM investigation of retained defects in Si wafer by 1 MeV Si ions bombardment

✍ Scribed by J.Y. Hsu; R.T. Huang; M.J. Hung; Y.C. Yu

• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 395 KB
• Volume: 268
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/j.nimb.2010.02.086