A systematic database of thin-film measurements by EPMA Part I – Aluminum films

✍ Scribed by G. F. Bastin; H. J. M. Heijligers

• Publisher: John Wiley and Sons
• Year: 2000
• Tongue: English
• Weight: 215 KB
• Volume: 29
• Category: Article
• ISSN: 0049-8246
• DOI: 10.1002/(sici)1097-4539(200005/06)29:3<212::aid-xrs422>3.0.co;2-k

✦ Synopsis

A systematic database of thin-film measurements on aluminum films by electron probe microanalysis is presented. The measurements were performed between 3 and 30 kV accelerating voltage on films of six different nominal thicknesses, ranging from 100 up to 3200 Å, which were deposited simultaneously on 20 different substrates, ranging between Be and Bi. The purpose of this work was to provide systematic data on which existing and future thin-film analysis programs can be tested. A total of 1060 k ratios for the film element Al were collected and 872 k ratios for the various substrate elements from underneath the films. Tests with our own most recent thin-film analysis program, TFA, based on the double Gaussian PROZA96 procedure, on this database showed excellent performance: a mean value of 1.0093 for k calc /k meas and a relative root-mean-square deviation of 4.2457% in the histogram for the film element.