The gas-phase Smiles rearrangement the e
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Peter C. H. Eichinger; John H. Bowie
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Article
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1992
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John Wiley and Sons
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English
β 391 KB
The gas-phase Smiles reaction of RC,H,O(CH,),O-(n = 2 or 3) is an ips0 rearrangement which is strongly influenced by the nature of the substituent R. Electron-withdrawing groups enhance the rearrangement. When the substituent R is halogen or MeO, and occupies the ortho position, ortho cyclization co