A SIMS study on the secondary ion yield in boron implanted silicon using a low energy primary oxygen beam

✍ Scribed by M. Tomita; F. Takahashi; Y. Homma

• Book ID: 113285854
• Publisher: Elsevier Science
• Year: 1994
• Tongue: English
• Weight: 494 KB
• Volume: 85
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/0168-583x(94)95853-x