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A simple method of depositing oxygen-free titanium silicide films using vacuum evaporation

✍ Scribed by S. Ahmad; J.P. Pachauri; J. Akhtar

Publisher: Elsevier Science
Year: 1986
Tongue: English
Weight: 406 KB
Volume: 143
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(86)90383-4

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