NO 2 concentration profiles in shock-heated NO 2 /Ar mixtures were measured in the temperature range of 1350 -2100 K and pressures up to 380 atm using Ar Ο© laser absorption at 472.7 nm, IR emission at , and visible emission at 300 -600 nm. In the course of this study, the absorption coefficient of N
A shock tube study of the reaction of H atoms with SiCl4
β Scribed by L. Catoire; D. Woiki; P. Roth
- Publisher
- John Wiley and Sons
- Year
- 1997
- Tongue
- English
- Weight
- 115 KB
- Volume
- 29
- Category
- Article
- ISSN
- 0538-8066
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β¦ Synopsis
The reaction of H atoms with SiCl 4 was studied behind reflected shock waves at temperatures between 1530 K and 1730 K and pressures around 1.5 bar by applying atomic resonance absorption spectroscopy (ARAS) for time resolved measurements of H atoms at the L β£ -line. The thermal decomposition of a few ppm ethyl iodide (C 2 H 5 I) was used as a Hatom source. In the presence of a high excess of the molecular reactant SiCl 4 a slow consumption of H was observed, which follows a pseudo-first-order rate law. Rate coefficient for the consumption of H by the reaction: (R1) was determined to be:
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π SIMILAR VOLUMES
Rate constants for H atom attack on GeH 4 and GeD 4 have been measured in pulsed photolysis experiments in which H atoms were produced by the mercury-sensitized photolysis of H 2 and monitored by Lyman-β£ absorption. The values obtained for GeD 4 in the temperature range 293 -550 K may be represented