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A semi-empirical model for the generation of dose distributions produced by a scanning electron beam

✍ Scribed by Ravinder Nath; Charles E. Gignac; Alfred G. Agostinelli; Sondra Rothberg; Robert J. Schulz

Publisher
Elsevier Science
Year
1980
Tongue
English
Weight
804 KB
Volume
6
Category
Article
ISSN
0360-3016

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The lithographic effect of electron beam in line exposures in scanning electron micruicopy (SEM) on poly(methy1 methacrylate) (PMMA) was evaluated using the line width in a film deposited on a silicium substrate and from the line profiles in a PMMA plate. It was found that the effect of the dose on