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A Scalable Parallel Algorithm for Reachability Analysis of Very Large Circuits

✍ Scribed by Tamir Heyman; Danny Geist; Orna Grumberg; Assaf Schuster


Book ID
110395161
Publisher
Springer
Year
2002
Tongue
English
Weight
716 KB
Volume
21
Category
Article
ISSN
0925-9856

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Al-SI-Cu films deposIted on substrates of SI, borophosphate silicate glass and TiW mth improved electrical properties (lower sheet resistance) and rehatnhty (lugher Al[lll] diffraction mtensity) obtained by the proposed metalbzatlon process are described A chemometrx approach of umfymg the expernnen