𝔖 Bobbio Scriptorium

✦ LIBER ✦

A novel technique for multiple-level dry etching (MULDE) featuring self-aligned etch masks

✍ Scribed by B. Boche

Publisher: Elsevier Science
Year: 1994
Tongue: English
Weight: 542 KB
Volume: 26
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(94)90045-0

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

7631. Selective suppression of photochem

7631. Selective suppression of photochemical dry etching using elevated surface impurity concentrations: a new technique for self-aligned etching: C I H Ashby et al, J Appl Phys, 68, 1990, 2406–2410

📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 299 KB