✦ LIBER ✦
7631. Selective suppression of photochemical dry etching using elevated surface impurity concentrations: a new technique for self-aligned etching: C I H Ashby et al, J Appl Phys, 68, 1990, 2406–2410
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 299 KB
- Volume
- 42
- Category
- Article
- ISSN
- 0042-207X
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