A novel self-aligned gate process for half-micrometer gate GaAs ICs using ECR-CVD

✍ Scribed by Shikata, S.; Tsuchimoto, J.; Hayashi, H.

• Book ID: 114536812
• Publisher: IEEE
• Year: 1990
• Tongue: English
• Weight: 518 KB
• Volume: 37
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/16.57129