A novel positive-type photosensitive polyimide based on soluble block copolyimide showing low dielectric constant with a low-temperature curing process

A novel positive-type photosensitive pol

A novel positive-type photosensitive polyimide having excellent transparency based on soluble block copolyimide with hydroxyl group and diazonaphthoquintone

✍ XingZhou Jin; Hiroyuki Ishii 📂 Article 📅 2005 🏛 John Wiley and Sons 🌐 English ⚖ 121 KB 👁 1 views

A positive-working photosensitive alkali

A positive-working photosensitive alkaline-developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound

✍ H. Seino; A. Mochizuki; O. Haba; M. Ueda 📂 Article 📅 1998 🏛 John Wiley and Sons 🌐 English ⚖ 57 KB 👁 2 views

The contrast was misreported in the original article. The correct contrast is 2.3, not 7.8, as first stated.

A positive-working photosensitive alkali

A positive-working photosensitive alkaline-developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound

✍ Hiroshi Seino; Amane Mochizuki; Osamu Haba; Mitsuru Ueda 📂 Article 📅 1998 🏛 John Wiley and Sons 🌐 English ⚖ 212 KB 👁 2 views

A positive-working photosensitive polyimide precursor based on fluorinated poly(amic acid) (FPAA) and 2,3,4-tris(1-oxo-2-diazonaphthoquinon-4-ylsulfonyloxy-)benzophenone (D4SB) as a photosensitive compound has been developed. FPAA was prepared by ring-opening polyaddition of dianhydrides, pyromellit