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A Novel PECVD Procedure for the Room-Temperature Synthesis of SiO2 Thin Films with Controlled Porosity

✍ Scribed by A. Barranco; J. Cotrino; F. Yubero; J.P. Espinós; L. Contreras; A.R. González-Elipe

Publisher
John Wiley and Sons
Year
2004
Tongue
English
Weight
307 KB
Volume
10
Category
Article
ISSN
0948-1907

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