A novel isolation technology utilizing Si selective epitaxial growth

✍ Scribed by Atsushi Hori; Takehiro Hirai

• Publisher: John Wiley and Sons
• Year: 1996
• Tongue: English
• Weight: 538 KB
• Volume: 79
• Category: Article
• ISSN: 8756-663X
• DOI: 10.1002/ecjb.4420791206