A novel isolation technology utilizing Si-selective epitaxial growth

✍ Scribed by Atsushi Hori; Takehiro Hirai

• Publisher: John Wiley and Sons
• Year: 1997
• Tongue: English
• Weight: 844 KB
• Volume: 80
• Category: Article
• ISSN: 8756-663X
• DOI: 10.1002/(sici)1520-6432(199708)80:8<46::aid-ecjb6>3.0.co;2-0