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A novel homomorphic processing of ultrasonic echoes for layer thickness measurement

✍ Scribed by Martin, C.; Meister, J.-J.; Arditi, M.; Farine, P.-A.

Book ID
119789335
Publisher
IEEE
Year
1992
Tongue
English
Weight
593 KB
Volume
40
Category
Article
ISSN
1053-587X

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A novel process for the preparation of t
A novel process for the preparation of thick porous silicon layers with very high porosity
✍ Feyh, A. ;Laermer, F. ;KronmΓΌller, S. ;Mokwa, W. πŸ“‚ Article πŸ“… 2005 πŸ› John Wiley and Sons 🌐 English βš– 145 KB

## Abstract A novel process for the preparation of thick porous silicon layers having very high porosities is proposed. Starting with thick layers of intermediate porosity the porosity is further increased in an additional step. This is done by means of controlled partial oxidation of the silicon s